KP300 Series
KP300 Series pressure controller features ultra-compact size for system integration, cost-effective solution, high precision and high resolution, excellent zero stability, good repeatability, ultra-fast response time. Suitable for semiconductor wafer helium cooling system, liquid source pressure control system, MOCVD vapor pressure control and other applications.
Key Specifications
Applications
Model Specifications
| Pressure Control Parameters | |
| Pressure Control Range | 0~50/100 Torr |
| Pressure Control Accuracy | ±0.5%F.S. |
| Control Range | 1~100%F.S. |
| Response Time | ≤1s |
| Flow Detection Parameters | |
| Flow Detection Range (NH3) | 0~20/50/100 sccm (please contact us for others) |
| Flow Detection Accuracy | 0~25%F.S.: <0.3%F.S. >25%F.S.: 1%RD |
| Leak Rate | |
| External Leak Rate | ≤1×10⁻¹² Pa·m³/s (N2) |
| Internal Leak Rate | <0.1 sccm (N2) |
| Electrical Parameters | |
| Power Supply | 18~32V (24V recommended) |
| Pressure Signal Output | 0~10V |
| Flow Signal Output | 0~5V |
| Communication Interface | |
| Communication | RS485, EtherCAT, DeviceNet |
| Mechanical Parameters | |
| Connector Type | 1/4 VCR |
| Inlet Pressure Range | 1.5~3 bar |
| Environmental Conditions | |
| Operating Temperature | 15~40℃ |
•KP300 Series features ultra-compact size, suitable for system integration.
•Cost-effective solution with high precision and high resolution.
•Suitable for semiconductor wafer helium cooling system, liquid source pressure control system, MOCVD vapor pressure control.
Key Features
Highly Integrated
One-stop gas path solution
Compact Design
Space saving
Easy Installation
Ready to use
Customizable
Tailored to needs
High Reliability
Overall testing verified
Professional Design
Engineer team support
Applications
Downloads
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